CANON FPA-5510IX

Classification:

Back-channel Equipment (testing)

Product Name:

Stepper

FPA-5510iX steppers adopt a high-NA, 1/2 reduction projection lens to deliver 0.5 um resolution across a large 50 mm x 50 mm exposure field. The FPA-5510iX is suitable for products requiring large field exposure such as *MEMS devices and image sensors that can require a larger field than Front-End-Of-the-Line (FEOL) lithography exposure area (26mm x 33mm) and can avoid pattern **stitching that is disadvantageous from the viewpoint of image quality & productivity. The ability to expose large fields in a single exposure provides the FPA-5510iX with a big advantage.

● Norm

Model Type	Hline（365 nm）stepper
Wafer Size	300 mm、200 mm
Resolutlon	≤ 500nm
Numerical Aperture (NA)	0.28 ~ 0.37
Reticle Slze	6 in.（0.25 in.thlck）
Reductlon Ratlo	21
Fleld Size	52 mm（max） x 56 mm（max）( dlan 70.7 mm)
Overlay Accuracy	≤ 50 纳米 (lml+3)
Footprint (W x D x H)	2.300 mm x 3.340 mm x 2.700 mm
Options	Low Oxygen Exposure (LOX) Exdtended AGA (EAGA) Wide-Band OAS WB-OAS) Pellcle Particle checker Chemical Filtering Resist Outgassing Unit PC Remote Console Onllne Functons (GEM2, GEMO304)