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EVG 805 SOI

Classification:

Front-end Equipment (production)

Product Name:

Automated production bonding systems


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  • Description
  • Parameters

    SOI wafers are a promising new basic material for the microelectronics industry to produce faster and higher-performance microelectronic devices. Wafer bonding, as one key enabling technology for the SOI wafer fabrication process, achieves high-quality single-crystal silicon films on insulating substrates. With the EVG850 SOI production bonding system, all essential steps for SOI bonding – from cleaning and alignment to pre-bonding and IR-inspection – are combined. Thus, the EVG850 assures a high-yield production process for void-free SOI wafers up to 300 mm sizes. Being the only production system built to operate in high-throughput, high-yield environments, the EVG850 has been established as the industry standard in the SOI wafer market.

  • ●  Hallmark

    (1) Production systems built to operate in high-throughput, high-production environments

    (2) Automated cassette-to-cassette or FOUP-to-FOUP operation

    (3) Contamination-free backside processing

    (4) Ultrasonic and/or brush cleaning

    (5) Pre-bonding by mechanical flush or notch alignment

    (6) Advanced remote diagnostics

    ●  Technical Parameters

    (1) Chip diameter (substrate size)

    100-200, 150-300 mm

    Fully automatic money box to money box operation

    (2) Pre-bonding chamber

    Alignment type: Flat to flat or notch to notch

    Alignment accuracy: X and Y: ±50 µm, θ: ±0.1°

    Bonding force: up to 5 N Bond wave start position: flexible from wafer edge to center

    Vacuum system: 9x10-2 mbar (standard) and 9x10-3 mbar (optional turbo pump)

    (3) Cleaning station

    Cleaning method: Flushing (standard), megasonic nozzle, megasonic area sensor, nozzle, brush (optional)

    Combustion chamber: made of PP or PFA (optional)

    Cleaning media: DI water (standard), NH4OH and H2O2 up to 2% (optional)

    Spinner chuck: Vacuum chuck (standard) and edge treatment chuck (optional), made of metal-free ionic cleaning material

    Rotation: up to 3000 rpm (within 5 seconds)

    Cleaning arms: up to 5 media lines (2 lines for 1 MHz systems)

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